Vemula, Sai Krishna and Raavi, Sai Santosh Kumar
(2022)
Ion‐Implantation in Titania‐Based Plasmonic Photo‐anodes: A Review.
John Wiley and Sons Inc.
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Abstract
The metal-oxide semiconductors exhibit remarkable optoelectronic properties and have immense implication in applications involving energy conversion, light emission, environmental remediation, etc. The presence of metal nanostructures in titanium dioxide (TiO2), zinc oxide metal-oxide semiconductors have enhanced the photo-activity, due to the plasmon resonances and are predominantly researched for organic and perovskite photovoltaics. Generally, the metal nanoparticle dopants are introduced by methods like sputtering, sol–gel, etc. However, compared with conventional doping methods, ion-implantation technique is a purely physical process, and a high controllability and repeatability can be achieved. Here, the current status of synthesis of nanocomposites in TiO2-based photo-anodic applications by ion-implantation method is reviewed, and there is no elaborate review on this topic. Finally, the future prospects of ion-implantation technique for controlling the excitonic behavior in TiO2 are discussed. © 2022 Wiley-VCH GmbH.
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IITH Creators: |
IITH Creators | ORCiD |
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Raavi, Sai Santosh Kumar | http://orcid.org/0000-0002-2496-9233 |
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Item Type: |
Other
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Additional Information: |
S.K.V. is thankful to Indian Space Research Organisation (ISRO) for all the support to pursue his doctoral studies at the Indian Institute of Technology Hyderabad (IITH). The authors acknowledge support from Department of Science and Technology, India, (Grant Number: BRICS/PilotCall2/IEEE‐OSC/2018 (G)); Department of Science and Technology, India, (Grant Number: CRG/2019/003197); and Inter‐University Accelerator Centre, India, Beam Time Number: 64511. |
Uncontrolled Keywords: |
charge recombination; electron injection; excitons; ion-implantation; photo-anode; photo-catalysis; plasmonics |
Subjects: |
Physics |
Divisions: |
Department of Physics |
Depositing User: |
. LibTrainee 2021
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Date Deposited: |
25 Jul 2022 10:06 |
Last Modified: |
25 Jul 2022 10:06 |
URI: |
http://raiithold.iith.ac.in/id/eprint/9913 |
Publisher URL: |
http://doi.org/10.1002/admi.202200085 |
OA policy: |
https://v2.sherpa.ac.uk/id/publication/27219 |
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