Effect of RF sputtering parameters on the nanoscratch properties of quinary Ti-Zr-Cu-Ni-Al thin film metallic glass

Paremmal, P. and Karati, A. and Murty, B S and et al, . (2022) Effect of RF sputtering parameters on the nanoscratch properties of quinary Ti-Zr-Cu-Ni-Al thin film metallic glass. Journal of Alloys and Compounds, 908. pp. 1-12. ISSN 0925-8388

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Abstract

Recently, thin film metallic glasses (TFMGs) gained renewed attention as they can circumvent the brittleness problem of bulk metallic glasses. When sputtered from a multicomponent cast target, the composition control of TFMG is always challenging. Here, we demonstrate the tight composition control of sputtered Ti-Zr-Cu-Ni-Al TFMG by a spark plasma sintered multicomponent target and investigate their structural and nanoscratch properties. The radio frequency (RF) power and Ar pressure were tuned to optimize nanoscratch properties. The highest hardness (~16.2 GPa) and thus best nanoscratch resistance was obtained at an RF power of 160 W and Ar pressure of 7 Pa. The best nanoscratch properties originated from the dense, fine column morphology of the TFMG. Moreover, it was found that the scratch mechanism changed from plowing to a combination of plowing and stick-slip under a ramping scratching load of 10 mN. The transition happened progressively at lower loads when the hardness of the TFMG decreased. This study provides a useful guideline for developing TFMG as a scratch-resistant protective coating. Â© 2022 Elsevier B.V.

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IITH Creators:

IITH Creators	ORCiD
Murty, B S	https://orcid.org/0000-0002-4399-8531

Item Type:

Article

Additional Information:

The authors would like to thank Mr. Rahul S. and Dr. Sreeram K. Kalpathy of IIT Madras for contact angle measurements carried out in their lab on the Acam-D3 equipment (EMR/2016/001479 SERB, New Delhi, India). The authors would also like to thank Dr. Rajesh Korla of IIT Hyderabad, India, for the nano-scratch test carried out in their lab.

Uncontrolled Keywords:

Elastic modulus, Hardness, Nano-scratch, RF-sputtering, Thin film metallic glass

Subjects:

Others > Metallurgy Metallurgical Engineering
Physics
Chemistry

Divisions:

Department of Material Science Engineering

Depositing User:

. LibTrainee 2021

Date Deposited:

22 Jun 2022 04:57

Last Modified:

22 Jun 2022 09:09