Chemical Vapor Deposition Setup for Graphene and other 2D materials

Ikbal, Md Aasif and Kumar, Shishir (2019) Chemical Vapor Deposition Setup for Graphene and other 2D materials. Masters thesis, Indian institute of technology Hyderabad.

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Abstract

Two dimensional materials has enormous applications in electronics, sensors, optoelectronics, water purification, medicine, biomedical and many more areas. Development of these 2-D materials in a cost efficient and high quality became challenging task. Out of all 2-D materials, graphene is the first 2D material discovered in 2004. Many conventional ways are present to develop these monolayers things and chemical vapor deposition (CVD) is the recent method that is popularly used for developing high quality monolayers on a large scale. This thesis address the development of graphene with the newly developed automated CVD method. The objective of this thesis is to provide a guide to design, implement and operate a CVD reactor for the growth of 2-D materials such as graphene, CNTs, GNRs, polysilicon, silicon dioxide etc. Leveraging open source, a fully automated CVD setup with controlling parameters such as pressure, gas flow rate, temperature, and other devices being activated, deactivated and controlled by open source software and hardware resources has been prepared. In this CVD system, a single computer Raspberry pi has been used, this Rpi acts as the main controlling unit of the whole CVD control flow setup. Rpi is a fully functional computer running Linux based Raspbian OS. Rpi can run multiple servers and can have a GUI on its own which help us to manage controlled flow of parameters and dynamically changing if necessary

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