Sharma, Chandra Shekhar and Katepalli, H and Sharma, A and Teixidor, G T and Madou, M J
(2014)
Fabrication of Resorcinol-Formaldehyde Xerogel based High Aspect Ratio 3-D Hierarchical C-MEMS Structures.
ECS Transactions, 61 (7).
pp. 45-54.
ISSN 1938-5862
Abstract
We demonstrate a novel method to fabricate arrays of resorcinol-
formaldehyde xerogel (RFX) based high aspect ratio (HAR) three-
dimensional (3-D) hierarchical C-MEMS structures. Starting from
a master pattern of HAR 3-D posts fabricated in SU-8 negative
photoresist by photolithography, a negative PDMS stamp with
arrays of holes was prepared by micromolding. The PDMS stamp
was then used to fabricate HAR 3-D RFX posts by replica molding.
The 3-D RFX posts thus fabricated were electrosprayed with SU-8
or an RF sol in the form of submicron or nano sized droplets and
followed by pyrolysis to yield HAR 3-D hierarchical carbon posts.
To characterize their use in C-MEMS based batteries,
galvanostatic (charge and discharge) experiments on RFX derived
carbon showed that it can be reversibly intercalated with Li ions
and possesses superior intercalation properties as compared to SU-
8 derived carbon which is a widely used material in C-MEMS.
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